Formation mechanisms of ZnO amorphous layers due to thermal treatment of ZnO thin films grown on p-InP (100) substrates
Jong Min Yuk, Jeong Yong Lee, Y.S. No, T. W. Kim, Won Kook Choi
Abstract
Jong Min Yuk, Jeong Yong Lee, Y.S. No, T. W. Kim, Won Kook Choi
Abstract
High-resolution transmission electron microscopy (HRTEM) images, selected-area electron diffraction (SAED) patterns, and energy dispersive x-ray spectroscopy (EDS) profiles showed that P atoms accumulated due to thermal treatment on the top sides and in the heterointerface layers of ZnO thin films grown on p-InP (100) substrates, resulting in the formation of amorphous ZnO layers in the ZnO thin films. The formation mechanisms of the ZnO amorphous layers due to thermal treatment are described on the basis of the HRTEM, the SAED, and the EDS measurements.
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High-resolution transmission electron microscopy (HRTEM) images, selected-area electron diffraction (SAED) patterns, and energy dispersive x-ray spectroscopy (EDS) profiles showed that P atoms accumulated due to thermal treatment on the top sides and in the heterointerface layers of ZnO thin films grown on p-InP (100) substrates, resulting in the formation of amorphous ZnO layers in the ZnO thin films. The formation mechanisms of the ZnO amorphous layers due to thermal treatment are described on the basis of the HRTEM, the SAED, and the EDS measurements.
Key concepts: High-resolution transmission electron microscopy, Selected area diffraction, Amorphous solid, Transmission electron microscopy, Materials science, Thin film, Electron diffraction, Thermal treatment