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1981•Zeitschrift für Naturforschung AOpen access

Carbon Contaminant Buildup and Sputtering Behaviour on Zinc Oxide During XPS Examination

Mladen Mintas, G. W. Filby

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Abstract

Abstract The effect of argon and oxygen sputtering on carbon contaminant buildup on ZnO during XPS (X-ray photoelectron spectroscopy) analysis has been examined. Argon and oxygen sputtering cause a rapid decline in hydroxyl oxygen and contaminant carbon content at the surface. Reduc­tion to metallic zinc is not observed. In a carefully baked instrument after sputtering a stable clean surface could be maintained over several hours of analysis.

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Abstract The effect of argon and oxygen sputtering on carbon contaminant buildup on ZnO during XPS (X-ray photoelectron spectroscopy) analysis has been examined. Argon and oxygen sputtering cause a rapid decline in hydroxyl oxygen and contaminant carbon content at the surface. Reduc­tion to metallic zinc is not observed. In a carefully baked instrument after sputtering a stable clean surface could be maintained over several hours of analysis.

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Available abstract

Abstract The effect of argon and oxygen sputtering on carbon contaminant buildup on ZnO during XPS (X-ray photoelectron spectroscopy) analysis has been examined. Argon and oxygen sputtering cause a rapid decline in hydroxyl oxygen and contaminant carbon content at the surface. Reduc­tion to metallic zinc is not observed. In a carefully baked instrument after sputtering a stable clean surface could be maintained over several hours of analysis.

Key concepts: Sputtering, X-ray photoelectron spectroscopy, Argon, Zinc, Oxygen, Carbon fibers, Materials science, Oxide

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