1984Applied Physics LettersRequires access

AlGaAs double-heterostructure diode lasers fabricated on a monolithic GaAs/Si substrate

T. H. Windhorn, G. Metze, B-Y. Tsaur, John C. C. Fan

Open publisher page 108 citations

Abstract

AlGaAs double-heterostructure diode lasers have been fabricated for the first time on a monolithic GaAs/Si substrate. The heterostructure was prepared by growth of a series of GaAs and AlGaAs layers on a Ge-coated Si wafer. For pulsed operation at 77 K the lowest threshold current was 260 mA, the highest power output was 1.8 mW per facet, and the highest differential quantum efficiency was 1.2%.

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What this paper is about

AlGaAs double-heterostructure diode lasers have been fabricated for the first time on a monolithic GaAs/Si substrate. The heterostructure was prepared by growth of a series of GaAs and AlGaAs layers on a Ge-coated Si wafer. For pulsed operation at 77 K the lowest threshold current was 260 mA, the highest power output was 1.8 mW per facet, and the highest differential quantum efficiency was 1.2%.

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OpenAlex reports 108 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

AlGaAs double-heterostructure diode lasers have been fabricated for the first time on a monolithic GaAs/Si substrate. The heterostructure was prepared by growth of a series of GaAs and AlGaAs layers on a Ge-coated Si wafer. For pulsed operation at 77 K the lowest threshold current was 260 mA, the highest power output was 1.8 mW per facet, and the highest differential quantum efficiency was 1.2%.

Key concepts: Optoelectronics, Heterojunction, Materials science, Wafer, Double heterostructure, Diode, Laser, Substrate (aquarium)

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