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2009•Chemical PhysicsRequires access

Oxidation of deposited Aun (n=2–13) on SiO2/Si: Influence of the NaOH(aq) treatment

Dong Chan Lim, Rainer Dietsche, Gerd F. Ganteför, Young Dok Kim

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Key concepts: Chemistry, X-ray photoelectron spectroscopy, Inert gas, Cluster (spacecraft), Oxide, Inert, Aqueous solution, Reactivity (psychology)

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Oxidation of deposited Aun (n=2–13) on SiO2/Si: Influence of the NaOH(aq) treatment — Research Paper | ScholarLens