2011Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIERequires access

Subwavelength binary blazed grating optical switch based on TiO 2 -on-SiO 2

Junbo Yang, Zhou Wei, Hualiang Zhang, Xueao Zhang, Honghui Jia, Shiqiao Qin

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Abstract

A high-perform and compact subwavelength binary blazed grating optical switch was designed based on TiO2-on-SiO2. By appropriate choice of grating parameters including thicknesses, periods, height, and fill factor, to optimize the diffraction properties, a relative high diffraction efficiency and large diffraction angle was obtained simultaneously. The diffraction efficiency of the first switching channel is about 80% with a 45° diffraction angle, and the diffraction efficiency of the second channel is around 90% with a 30° diffraction angle. The device layout is simple, feasible, one-step etch, and compatible with standard CMOS technology processing.

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What this paper is about

A high-perform and compact subwavelength binary blazed grating optical switch was designed based on TiO2-on-SiO2. By appropriate choice of grating parameters including thicknesses, periods, height, and fill factor, to optimize the diffraction properties, a relative high diffraction efficiency and large diffraction angle was obtained simultaneously. The diffraction efficiency of the first switching channel is about 80% with a 45° diffraction angle, and the diffraction efficiency of the second channel is around 90% with a 30° diffraction angle. The device layout is simple, feasible, one-step etch, and compatible with standard CMOS technology processing.

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Available abstract

A high-perform and compact subwavelength binary blazed grating optical switch was designed based on TiO2-on-SiO2. By appropriate choice of grating parameters including thicknesses, periods, height, and fill factor, to optimize the diffraction properties, a relative high diffraction efficiency and large diffraction angle was obtained simultaneously. The diffraction efficiency of the first switching channel is about 80% with a 45° diffraction angle, and the diffraction efficiency of the second channel is around 90% with a 30° diffraction angle. The device layout is simple, feasible, one-step etch, and compatible with standard CMOS technology processing.

Key concepts: Diffraction efficiency, Diffraction, Diffraction grating, Materials science, Blazed grating, Optics, Grating, Electromagnetically induced grating

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