1960Journal of Applied PhysicsRequires access

Production and Properties of Thin Layers of Indium Antimonide

Geoffrey Bate, K. Taylor

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Abstract

A new method of producing thin layers of indium antimonide is described. This consists of suddenly squashing a drop of molten indium antimonide between two optical flats and allowing it to cool. Large area, self-supporting specimens of 10-μ thickness have been prepared in this way and their properties examined. Although these layers are polycrystalline, their electrical and optical properties are in good agreement with the single-crystal materials from which they were obtained.

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A new method of producing thin layers of indium antimonide is described. This consists of suddenly squashing a drop of molten indium antimonide between two optical flats and allowing it to cool. Large area, self-supporting specimens of 10-μ thickness have been prepared in this way and their properties examined. Although these layers are polycrystalline, their electrical and optical properties are in good agreement with the single-crystal materials from which they were obtained.

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Available abstract

A new method of producing thin layers of indium antimonide is described. This consists of suddenly squashing a drop of molten indium antimonide between two optical flats and allowing it to cool. Large area, self-supporting specimens of 10-μ thickness have been prepared in this way and their properties examined. Although these layers are polycrystalline, their electrical and optical properties are in good agreement with the single-crystal materials from which they were obtained.

Key concepts: Indium antimonide, Indium, Antimonide, Materials science, Crystallite, Thin film, Optoelectronics, Gallium antimonide

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