Production and Properties of Thin Layers of Indium Antimonide
Geoffrey Bate, K. Taylor
Abstract
Geoffrey Bate, K. Taylor
Abstract
A new method of producing thin layers of indium antimonide is described. This consists of suddenly squashing a drop of molten indium antimonide between two optical flats and allowing it to cool. Large area, self-supporting specimens of 10-μ thickness have been prepared in this way and their properties examined. Although these layers are polycrystalline, their electrical and optical properties are in good agreement with the single-crystal materials from which they were obtained.
OpenAlex reports 14 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
A new method of producing thin layers of indium antimonide is described. This consists of suddenly squashing a drop of molten indium antimonide between two optical flats and allowing it to cool. Large area, self-supporting specimens of 10-μ thickness have been prepared in this way and their properties examined. Although these layers are polycrystalline, their electrical and optical properties are in good agreement with the single-crystal materials from which they were obtained.
Key concepts: Indium antimonide, Indium, Antimonide, Materials science, Crystallite, Thin film, Optoelectronics, Gallium antimonide