2008•Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIERequires access

Dimensional nanometrology at the National Physical Laboratory

Andrew Yacoot, Richard Leach, Ben Hughes, Claudiu L. Giusca, Christopher W. Jones, Alan C. Wilson

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Abstract

The growth in nanotechnology has led to an increased requirement for traceable dimensional measurements of nanometre-sized objects and micrometre-sized objects with nanometre tolerances. To meet this challenge NPL has developed both purpose built instrumentation and added metrology to commercially available equipment. This paper describes the development and use of a selection of these instruments that include: atomic force microscopy, x-ray interferometry, a low force balance, a micro coordinate measuring machine and an areal surface texture measuring instrument.

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What this paper is about

The growth in nanotechnology has led to an increased requirement for traceable dimensional measurements of nanometre-sized objects and micrometre-sized objects with nanometre tolerances. To meet this challenge NPL has developed both purpose built instrumentation and added metrology to commercially available equipment. This paper describes the development and use of a selection of these instruments that include: atomic force microscopy, x-ray interferometry, a low force balance, a micro coordinate measuring machine and an areal surface texture measuring instrument.

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Available abstract

The growth in nanotechnology has led to an increased requirement for traceable dimensional measurements of nanometre-sized objects and micrometre-sized objects with nanometre tolerances. To meet this challenge NPL has developed both purpose built instrumentation and added metrology to commercially available equipment. This paper describes the development and use of a selection of these instruments that include: atomic force microscopy, x-ray interferometry, a low force balance, a micro coordinate measuring machine and an areal surface texture measuring instrument.

Key concepts: Nanometrology, Metrology, Nanometre, Instrumentation (computer programming), Atomic force microscopy, Dimensional metrology, Nanotechnology, Interferometry

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