Dimensional nanometrology at the National Physical Laboratory
Andrew Yacoot, Richard Leach, Ben Hughes, Claudiu L. Giusca, Christopher W. Jones, Alan C. Wilson
Abstract
Andrew Yacoot, Richard Leach, Ben Hughes, Claudiu L. Giusca, Christopher W. Jones, Alan C. Wilson
Abstract
The growth in nanotechnology has led to an increased requirement for traceable dimensional measurements of nanometre-sized objects and micrometre-sized objects with nanometre tolerances. To meet this challenge NPL has developed both purpose built instrumentation and added metrology to commercially available equipment. This paper describes the development and use of a selection of these instruments that include: atomic force microscopy, x-ray interferometry, a low force balance, a micro coordinate measuring machine and an areal surface texture measuring instrument.
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The growth in nanotechnology has led to an increased requirement for traceable dimensional measurements of nanometre-sized objects and micrometre-sized objects with nanometre tolerances. To meet this challenge NPL has developed both purpose built instrumentation and added metrology to commercially available equipment. This paper describes the development and use of a selection of these instruments that include: atomic force microscopy, x-ray interferometry, a low force balance, a micro coordinate measuring machine and an areal surface texture measuring instrument.
Key concepts: Nanometrology, Metrology, Nanometre, Instrumentation (computer programming), Atomic force microscopy, Dimensional metrology, Nanotechnology, Interferometry