Control of Pore Size in Mesoporous Silica by Incremental Surface Modification Using Tetramethyl Orthosilicate
Ryohei ISHIMARU, Yusuke Shibasaki, Masahiko Hara, Mitsuru Ueda, Kazunari Domen, Junko N. Kondo
Abstract
Ryohei ISHIMARU, Yusuke Shibasaki, Masahiko Hara, Mitsuru Ueda, Kazunari Domen, Junko N. Kondo
Abstract
Abstract The pore size of mesoporous silica is precisely controlled by repeated surface treatment with tetramethyl orthosilicate (TMOS) and water. This surface treatment produces a silica monolayer by reaction between surface hydroxy groups and TMOS, and successive water treatment regenerates the surface silanol groups ready for further TMOS modification. This treatment method reduces the pore size of SBA-15 mesoporous silica incrementally by ca. 0.5 nm per treatment step, while preserving the original hexagonal pore structure.
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Abstract The pore size of mesoporous silica is precisely controlled by repeated surface treatment with tetramethyl orthosilicate (TMOS) and water. This surface treatment produces a silica monolayer by reaction between surface hydroxy groups and TMOS, and successive water treatment regenerates the surface silanol groups ready for further TMOS modification. This treatment method reduces the pore size of SBA-15 mesoporous silica incrementally by ca. 0.5 nm per treatment step, while preserving the original hexagonal pore structure.
Key concepts: Chemistry, Tetraethyl orthosilicate, Orthosilicate, Mesoporous material, Surface modification, Mesoporous silica, Chemical engineering, Organic chemistry