Progress of graphene growth on copper by chemical vapor deposition: Growth behavior and controlled synthesis
Lai‐Peng Ma, Wencai Ren, Zaili Dong, Lianqing Liu, Hui–Ming Cheng
Abstract
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Lai‐Peng Ma, Wencai Ren, Zaili Dong, Lianqing Liu, Hui–Ming Cheng
Abstract
Open-access reader
Recently, chemical vapor deposition (CVD) on copper has been becoming a main method for preparing large-area and high- quality monolayer graphene. In this paper, we first briefly introduce the preliminary understanding of the microstructure and growth behavior of graphene on copper, and then focus on the recent progress on the quality improvement, number of layers control and transfer-free growth of graphene. In the end, we attempt to analyze the possible development of CVD growth of graphene in future, including the controlled growth of large-size single-crystal graphene and bilayer graphene with different stacking orders.
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Recently, chemical vapor deposition (CVD) on copper has been becoming a main method for preparing large-area and high- quality monolayer graphene. In this paper, we first briefly introduce the preliminary understanding of the microstructure and growth behavior of graphene on copper, and then focus on the recent progress on the quality improvement, number of layers control and transfer-free growth of graphene. In the end, we attempt to analyze the possible development of CVD growth of graphene in future, including the controlled growth of large-size single-crystal graphene and bilayer graphene with different stacking orders.
Key concepts: Graphene, Chemical vapor deposition, Bilayer graphene, Materials science, Stacking, Copper, Nanotechnology, Monolayer