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Concentration and Mobilities of Holes and Electrons in Bi-2223 Thin Films from Analysis of Resistivity and Hall Effect Data

P. Sánchez, H. Sánchez

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Abstract

Hall effect and resistivity measurements in Bi-2223 thin films were carried out using the van der Pauw method. A two-band model involving holes and electrons was used to fit the experimental data. The analysis showed that the resistivity and Hall coefficient are mainly hole dependent. However, the electron contribution to the Hall coefficient cannot be ruled out.

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Hall effect and resistivity measurements in Bi-2223 thin films were carried out using the van der Pauw method. A two-band model involving holes and electrons was used to fit the experimental data. The analysis showed that the resistivity and Hall coefficient are mainly hole dependent. However, the electron contribution to the Hall coefficient cannot be ruled out.

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Available abstract

Hall effect and resistivity measurements in Bi-2223 thin films were carried out using the van der Pauw method. A two-band model involving holes and electrons was used to fit the experimental data. The analysis showed that the resistivity and Hall coefficient are mainly hole dependent. However, the electron contribution to the Hall coefficient cannot be ruled out.

Key concepts: Van der Pauw method, Hall effect, Electrical resistivity and conductivity, Condensed matter physics, Electron, Thin film, Materials science, Physics

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Concentration and Mobilities of Holes and Electrons in Bi-2223 Thin Films from Analysis of Resistivity and Hall Effect Data — Research Paper | ScholarLens