2005International Journal of Chemical KineticsRequires access

Quantum yield for hydrogen atom formation from H2O2 photolysis in the range 193–240 nm

Tomoki Nakayama, Kenshi Takahashi, Yutaka Matsumi

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Abstract

Abstract Photodissociation processes of H2O2 in the range 193–240 nm have been studied by pulsed laser photolysis and laser‐induced fluorescence detection of H atom fragments at 121.56 nm. The quantum yield values for H atom formation at 295 ± 2 K have been determined to be 0.20 ± 0.03, 0.038 ± 0.008, 0.029 ± 0.003, 0.015 ± 0.006, 0.007 ± 0.002 at 193, 207, 210, 220, and 230 nm, respectively. At 240 nm, only the upper limit value of <0.002 has been obtained. © 2005 Wiley Periodicals, Inc. Int J Chem Kinet 37: 751–754, 2005

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Abstract Photodissociation processes of H2O2 in the range 193–240 nm have been studied by pulsed laser photolysis and laser‐induced fluorescence detection of H atom fragments at 121.56 nm. The quantum yield values for H atom formation at 295 ± 2 K have been determined to be 0.20 ± 0.03, 0.038 ± 0.008, 0.029 ± 0.003, 0.015 ± 0.006, 0.007 ± 0.002 at 193, 207, 210, 220, and 230 nm, respectively. At 240 nm, only the upper limit value of <0.002 has been obtained. © 2005 Wiley Periodicals, Inc. Int J Chem Kinet 37: 751–754, 2005

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Available abstract

Abstract Photodissociation processes of H2O2 in the range 193–240 nm have been studied by pulsed laser photolysis and laser‐induced fluorescence detection of H atom fragments at 121.56 nm. The quantum yield values for H atom formation at 295 ± 2 K have been determined to be 0.20 ± 0.03, 0.038 ± 0.008, 0.029 ± 0.003, 0.015 ± 0.006, 0.007 ± 0.002 at 193, 207, 210, 220, and 230 nm, respectively. At 240 nm, only the upper limit value of <0.002 has been obtained. © 2005 Wiley Periodicals, Inc. Int J Chem Kinet 37: 751–754, 2005

Key concepts: Chemistry, Photodissociation, Quantum yield, Yield (engineering), Hydrogen atom, Fluorescence, Atom (system on chip), Analytical Chemistry (journal)

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