Quantum yield for hydrogen atom formation from H2O2 photolysis in the range 193–240 nm
Tomoki Nakayama, Kenshi Takahashi, Yutaka Matsumi
Abstract
Tomoki Nakayama, Kenshi Takahashi, Yutaka Matsumi
Abstract
Abstract Photodissociation processes of H2O2 in the range 193–240 nm have been studied by pulsed laser photolysis and laser‐induced fluorescence detection of H atom fragments at 121.56 nm. The quantum yield values for H atom formation at 295 ± 2 K have been determined to be 0.20 ± 0.03, 0.038 ± 0.008, 0.029 ± 0.003, 0.015 ± 0.006, 0.007 ± 0.002 at 193, 207, 210, 220, and 230 nm, respectively. At 240 nm, only the upper limit value of <0.002 has been obtained. © 2005 Wiley Periodicals, Inc. Int J Chem Kinet 37: 751–754, 2005
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Abstract Photodissociation processes of H2O2 in the range 193–240 nm have been studied by pulsed laser photolysis and laser‐induced fluorescence detection of H atom fragments at 121.56 nm. The quantum yield values for H atom formation at 295 ± 2 K have been determined to be 0.20 ± 0.03, 0.038 ± 0.008, 0.029 ± 0.003, 0.015 ± 0.006, 0.007 ± 0.002 at 193, 207, 210, 220, and 230 nm, respectively. At 240 nm, only the upper limit value of <0.002 has been obtained. © 2005 Wiley Periodicals, Inc. Int J Chem Kinet 37: 751–754, 2005
Key concepts: Chemistry, Photodissociation, Quantum yield, Yield (engineering), Hydrogen atom, Fluorescence, Atom (system on chip), Analytical Chemistry (journal)