2002Applied Physics LettersRequires access

Nanopatterning of alkyl monolayers covalently bound to Si(111) with an atomic force microscope

Masato Ara, Harald Graaf, Hirokazu Tada

Open publisher page 65 citations

Abstract

Alkyl monolayers covalently bound to silicon were prepared through the reaction between 1-alkene molecules and hydrogen-terminated Si. The surfaces were anodized in nanometer scale with a contact-mode atomic force microscope (AFM) by applying positive bias voltage to the surface with respect to a conducting cantilever under ambient conditions. Following the anodization, patterned areas were selectively modified by chemical etching and coating with different molecules. The alkyl monolayers showed high resistance against chemical etching and protected Si surfaces from oxidation. AFM lithography of monolayers on Si was found to be useful for nanofabrication of organic/inorganic interfaces based on the Si–C covalent bond.

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Alkyl monolayers covalently bound to silicon were prepared through the reaction between 1-alkene molecules and hydrogen-terminated Si. The surfaces were anodized in nanometer scale with a contact-mode atomic force microscope (AFM) by applying positive bias voltage to the surface with respect to a conducting cantilever under ambient conditions. Following the anodization, patterned areas were selectively modified by chemical etching and coating with different molecules. The alkyl monolayers showed high resistance against chemical etching and protected Si surfaces from oxidation. AFM lithography of monolayers on Si was found to be useful for nanofabrication of organic/inorganic interfaces based on the Si–C covalent bond.

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Available abstract

Alkyl monolayers covalently bound to silicon were prepared through the reaction between 1-alkene molecules and hydrogen-terminated Si. The surfaces were anodized in nanometer scale with a contact-mode atomic force microscope (AFM) by applying positive bias voltage to the surface with respect to a conducting cantilever under ambient conditions. Following the anodization, patterned areas were selectively modified by chemical etching and coating with different molecules. The alkyl monolayers showed high resistance against chemical etching and protected Si surfaces from oxidation. AFM lithography of monolayers on Si was found to be useful for nanofabrication of organic/inorganic interfaces based on the Si–C covalent bond.

Key concepts: Monolayer, Alkyl, Covalent bond, Materials science, Molecule, Etching (microfabrication), Self-assembled monolayer, Nanolithography

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