High responsivity ultraviolet photodetector realized via a carrier-trapping process
J. S. Liu, C. X. Shan, Bei Li, Z. Z. Zhang, Cheng Yang, Dazhong Shen, X.W. Fan
Abstract
J. S. Liu, C. X. Shan, Bei Li, Z. Z. Zhang, Cheng Yang, Dazhong Shen, X.W. Fan
Abstract
Metal-semiconductor-metal structured ultraviolet (UV) photodetector has been fabricated from zinc oxide films. The responsivity of the photodetector can reach 26 000 A/W at 8 V bias, which is the highest value ever reported for a semiconductor ultraviolet photodetector. The origin of the high responsivity has been attributed to the carrier-trapping process occurred in the metal-semiconductor interface, which has been confirmed by the asymmetric barrier height at the two sides of the metal-semiconductor interdigital electrodes. The results reported in this paper provide a way to high responsivity UV photodetectors, which thus may address a step toward future applications of UV photodetectors.
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Metal-semiconductor-metal structured ultraviolet (UV) photodetector has been fabricated from zinc oxide films. The responsivity of the photodetector can reach 26 000 A/W at 8 V bias, which is the highest value ever reported for a semiconductor ultraviolet photodetector. The origin of the high responsivity has been attributed to the carrier-trapping process occurred in the metal-semiconductor interface, which has been confirmed by the asymmetric barrier height at the two sides of the metal-semiconductor interdigital electrodes. The results reported in this paper provide a way to high responsivity UV photodetectors, which thus may address a step toward future applications of UV photodetectors.
Key concepts: Responsivity, Photodetector, Ultraviolet, Optoelectronics, Materials science, Semiconductor