1988•Japanese Journal of Applied PhysicsRequires access

Photoassociation of KrF Excimer at 248 nm

K. Hakuta, Kunihiko Nakayama, Masashi Fujino, Hiroshi Takuma

Abstract

KrF excimers are produced by irradiating the gas mix of Kr and F2 with KrF laser radiation at 248 nm. The excitation process is identified as a photoassociation process between colliding Kr and F atoms via photodissociation of F2 molecules. The present success has made it possible to investigate the collisional processes of KrF excimer quantitatively.

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Key concepts: Excimer, Photodissociation, Excimer laser, Excitation, Molecule, Radiation, Atomic physics, Laser