2000•IEEE Transactions on Electron DevicesRequires access

640×486 long-wavelength two-color GaAs/AlGaAs quantum well infrared photodetector (QWIP) focal plane array camera

Sarath D. Gunapala, Sumith V. Bandara, Anjali Singh, J.K. Liu, B. Rafol, E. M. Luong, Jason M. Mumolo, N. Q. Tran, David Z. Ting, John David Vincent, C. A. Shott, Jianzheng Long, Paul D. LeVan

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Abstract

We have designed and fabricated an optimized long-wavelength/very-long wavelength two-color quantum well infrared photodetector (QWIP) device structure. The device structure was grown on a 3-in semi-insulating GaAs substrate by molecular beam epitaxy (MBE). The wafer was processed into several 640/spl times/486 format monolithically integrated 8-9 and 14-15 /spl mu/m two-color (or dual wavelength) QWIP focal plane arrays (FPAs). These FPAs were then hybridized to 640/spl times/486 silicon CMOS readout multiplexers. A thinned (i.e., substrate removed) FPA hybrid was integrated into a liquid helium cooled dewar for electrical and optical characterization and to demonstrate simultaneous two-color imagery. The 8-9 /spl mu/m detectors in the FPA have shown background limited performance (BLIP) at 70 K operating temperature for 300 K background with f/2 cold stop. The 14-15 /spl mu/m detectors of the FPA reaches BLIP at 40 K operating temperature under the same background conditions. In this paper we discuss the performance of this long-wavelength dualband QWIP FPA in terms of quantum efficiency, detectivity, noise equivalent temperature difference (NE/spl Delta/T), uniformity, and operability.

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What this paper is about

We have designed and fabricated an optimized long-wavelength/very-long wavelength two-color quantum well infrared photodetector (QWIP) device structure. The device structure was grown on a 3-in semi-insulating GaAs substrate by molecular beam epitaxy (MBE). The wafer was processed into several 640/spl times/486 format monolithically integrated 8-9 and 14-15 /spl mu/m two-color (or dual wavelength) QWIP focal plane arrays (FPAs). These FPAs were then hybridized to 640/spl times/486 silicon CMOS readout multiplexers. A thinned (i.e., substrate removed) FPA hybrid was integrated into a liquid helium cooled dewar for electrical and optical characterization and to demonstrate simultaneous two-color imagery. The 8-9 /spl mu/m detectors in the FPA have shown background limited performance (BLIP) at 70 K operating temperature for 300 K background with f/2 cold stop. The 14-15 /spl mu/m detectors of the FPA reaches BLIP at 40 K operating temperature under the same background conditions. In this paper we discuss the performance of this long-wavelength dualband QWIP FPA in terms of quantum efficiency, detectivity, noise equivalent temperature difference (NE/spl Delta/T), uniformity, and operability.

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Available abstract

We have designed and fabricated an optimized long-wavelength/very-long wavelength two-color quantum well infrared photodetector (QWIP) device structure. The device structure was grown on a 3-in semi-insulating GaAs substrate by molecular beam epitaxy (MBE). The wafer was processed into several 640/spl times/486 format monolithically integrated 8-9 and 14-15 /spl mu/m two-color (or dual wavelength) QWIP focal plane arrays (FPAs). These FPAs were then hybridized to 640/spl times/486 silicon CMOS readout multiplexers. A thinned (i.e., substrate removed) FPA hybrid was integrated into a liquid helium cooled dewar for electrical and optical characterization and to demonstrate simultaneous two-color imagery. The 8-9 /spl mu/m detectors in the FPA have shown background limited performance (BLIP) at 70 K operating temperature for 300 K background with f/2 cold stop. The 14-15 /spl mu/m detectors of the FPA reaches BLIP at 40 K operating temperature under the same background conditions. In this paper we discuss the performance of this long-wavelength dualband QWIP FPA in terms of quantum efficiency, detectivity, noise equivalent temperature difference (NE/spl Delta/T), uniformity, and operability.

Key concepts: Optoelectronics, Photodetector, Quantum well infrared photodetector, Optics, Molecular beam epitaxy, Wafer, Materials science, Quantum efficiency

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