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Focused ion-beam specimen preparation for atom probe field-ion microscopy characterization of multilayer film structures

David J. Larson, D. T. Foord, Amanda K. Petford-Long, A. Cerezo, George Smith

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Abstract

Focused ion-beam milling with a sub-10 nm diameter beam of gallium ions has been used to fabricate field-ion specimens from a multilayer film nanostructure containing 100 repetitions of a bilayer deposited directly onto a planar substrate. Successful field-ion specimen preparation has allowed the observation of these layers on the atomic scale by both field-ion imaging and atom probe compositional analysis.

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Focused ion-beam milling with a sub-10 nm diameter beam of gallium ions has been used to fabricate field-ion specimens from a multilayer film nanostructure containing 100 repetitions of a bilayer deposited directly onto a planar substrate. Successful field-ion specimen preparation has allowed the observation of these layers on the atomic scale by both field-ion imaging and atom probe compositional analysis.

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Available abstract

Focused ion-beam milling with a sub-10 nm diameter beam of gallium ions has been used to fabricate field-ion specimens from a multilayer film nanostructure containing 100 repetitions of a bilayer deposited directly onto a planar substrate. Successful field-ion specimen preparation has allowed the observation of these layers on the atomic scale by both field-ion imaging and atom probe compositional analysis.

Key concepts: Materials science, Field ion microscope, Focused ion beam, Atom probe, Ion beam, Characterization (materials science), Ion, Substrate (aquarium)

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