1992Review of Scientific InstrumentsRequires access

Removal of superfluid helium films from surfaces below 0.1 K

R. Torii, S. R. Bandler, T. More, F. S. Porter, R. E. Lanou, Humphrey J. Maris, G. M. Seidel

Open publisher page 19 citations

Abstract

We have constructed an apparatus that is able to maintain a helium-free surface at low temperature (T≤0.1 K) in a cell containing superfluid helium. We discuss the considerations involved in the design of this device, and describe tests that we have made to confirm that a film-free surface has been produced.

About this research paper

What this paper is about

We have constructed an apparatus that is able to maintain a helium-free surface at low temperature (T≤0.1 K) in a cell containing superfluid helium. We discuss the considerations involved in the design of this device, and describe tests that we have made to confirm that a film-free surface has been produced.

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OpenAlex reports 19 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

We have constructed an apparatus that is able to maintain a helium-free surface at low temperature (T≤0.1 K) in a cell containing superfluid helium. We discuss the considerations involved in the design of this device, and describe tests that we have made to confirm that a film-free surface has been produced.

Key concepts: Superfluid helium-4, Helium, Superfluidity, Materials science, Helium-4, Liquid helium, Isotopes of helium, Lambda point refrigerator

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