2007•Microelectronic EngineeringRequires access

Simple high resolution nanoimprint-lithography

Michael Haffner, A. Heeren, Monika Fleischer, D. P. Kern, G. Schmidt, L. W. Molenkamp

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Key concepts: Nanoimprint lithography, Hydrogen silsesquioxane, Resist, Materials science, Nanotechnology, Electron-beam lithography, Nanolithography, Lithography

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Simple high resolution nanoimprint-lithography — Research Paper | ScholarLens