Carbon nanotube transistor optimization by chemical control of the nanotube–metal interface
Stéphane Auvray, Julien Borghetti, M. F. Goffman, Arianna Filoramo, Vincent Derycke, J.‐P. Bourgoin, O. Jost
Abstract
Stéphane Auvray, Julien Borghetti, M. F. Goffman, Arianna Filoramo, Vincent Derycke, J.‐P. Bourgoin, O. Jost
Abstract
Most carbon nanotube transistors work as Schottky barrier transistors. We show that chemical treatment of operational p-type nanotube transistors by trifluoro-acetic acid (TFA) leads to the drastic improvement of all the key device parameters. This effect is due to the highly polar nature of the TFA molecule which, once adsorbed at the metal–nanotube interface, lowers the Schottky barrier for the holes and thus favors their injection.
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Most carbon nanotube transistors work as Schottky barrier transistors. We show that chemical treatment of operational p-type nanotube transistors by trifluoro-acetic acid (TFA) leads to the drastic improvement of all the key device parameters. This effect is due to the highly polar nature of the TFA molecule which, once adsorbed at the metal–nanotube interface, lowers the Schottky barrier for the holes and thus favors their injection.
Key concepts: Nanotube, Carbon nanotube, Schottky barrier, Carbon nanotube field-effect transistor, Materials science, Carbon nanotube quantum dot, Transistor, Nanotechnology