The advanced nanofabrication technology
Ming Liu, Qiuxia Xu, Baoqin Chen, Changqing Xie, Tianchun Ye, Xinchun Liu
Abstract
Ming Liu, Qiuxia Xu, Baoqin Chen, Changqing Xie, Tianchun Ye, Xinchun Liu
Abstract
Some research results in advanced optical lithography, Electron beam lithography, X-ray lithography are introduced in this paper. For advanced optical lithography, optical proximity correction and phase-shift masking (PSM) are studied, and 150nm pattern is achieved by i-line Stepper using transparent PSM. For e-beam lithography, the resist process, proximity effect correction and mix & match technologies are investigated, and 27nm CMOS device is successfully fabricated. The 0.15μm GaAs PHEMT devices are successfully fabricated by employing X-ray lithography.
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Some research results in advanced optical lithography, Electron beam lithography, X-ray lithography are introduced in this paper. For advanced optical lithography, optical proximity correction and phase-shift masking (PSM) are studied, and 150nm pattern is achieved by i-line Stepper using transparent PSM. For e-beam lithography, the resist process, proximity effect correction and mix & match technologies are investigated, and 27nm CMOS device is successfully fabricated. The 0.15μm GaAs PHEMT devices are successfully fabricated by employing X-ray lithography.
Key concepts: Lithography, Stepper, Computational lithography, Next-generation lithography, Stencil lithography, Electron-beam lithography, Extreme ultraviolet lithography, Materials science