2004•Materials Science in Semiconductor ProcessingRequires access

Improving reactive ion etching selectivity of GaAs/AlGaAs with He plus

C.S. Lin, Yuanxing Fang, S.F. Chen, C.Y. Lin, M.C. Hsieh, C.C. Wang, H.K. Huang, Chao‐Liang Wu, C. S. Chang

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Key concepts: Selectivity, Materials science, Etching (microfabrication), Reactive-ion etching, Ion, Optoelectronics, Analytical Chemistry (journal), Nanotechnology

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