F. T. Smith
Abstract
A metalorganic chemical vapor deposition process for preparing c-axis-oriented ZnO films in a simple system of the type commercially available for SiO2 deposition is described. The resulting layers are highly uniform in thickness and adhere to a variety of substrates. Film properties and structure are described briefly.
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A metalorganic chemical vapor deposition process for preparing c-axis-oriented ZnO films in a simple system of the type commercially available for SiO2 deposition is described. The resulting layers are highly uniform in thickness and adhere to a variety of substrates. Film properties and structure are described briefly.
Key concepts: Chemical vapor deposition, Combustion chemical vapor deposition, Deposition (geology), Materials science, Metalorganic vapour phase epitaxy, Hybrid physical-chemical vapor deposition, Ion plating, Thin film