1987Japanese Journal of Applied PhysicsOpen access

Self-Developing Characteristics of Nitrocellulose Exposed to Ion Beams

Yoshizumi Yasuoka, K. Harakawa, Kenji Gamo, Susumu Namba

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Abstract

The self-developing and processing properties of nitrocellulose are investigated in comparison with other resists such as PMMA and PBS. It is found that only the nitrocellulose has the self-developing feature of the three resists, and that the self-developing rate of the nitrocellulose is independent of the polymerization grade of nitrocellulose, but is dependent on the nitrogen content in the nitrocellulose.

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What this paper is about

The self-developing and processing properties of nitrocellulose are investigated in comparison with other resists such as PMMA and PBS. It is found that only the nitrocellulose has the self-developing feature of the three resists, and that the self-developing rate of the nitrocellulose is independent of the polymerization grade of nitrocellulose, but is dependent on the nitrogen content in the nitrocellulose.

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Available abstract

The self-developing and processing properties of nitrocellulose are investigated in comparison with other resists such as PMMA and PBS. It is found that only the nitrocellulose has the self-developing feature of the three resists, and that the self-developing rate of the nitrocellulose is independent of the polymerization grade of nitrocellulose, but is dependent on the nitrogen content in the nitrocellulose.

Key concepts: Nitrocellulose, Collodion, Materials science, Chemistry, Nanotechnology, Analytical Chemistry (journal), Chromatography, Membrane

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