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Correlations between mean sputter depth and ion fluence during sputtering of binary component materials

Li-Ping Zheng, Risheng Li, Xi-Qing Xia, Minqian Li, Mingyao Li

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Key concepts: Sputtering, Fluence, Ion, Materials science, Monte Carlo method, Atomic physics, Chemistry, Physics

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Correlations between mean sputter depth and ion fluence during sputtering of binary component materials — Research Paper | ScholarLens