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1996•Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and PhenomenaRequires access

Field emission from ZrC films on Si and Mo single emitters and emitter arrays

Tianbao Xie, W.A. Mackie, P.R. Davis

Open publisher page 48 citations

Abstract

Field emission from ZrC films deposited on Si and Mo single emitters and field emitter arrays (FEAs) has been studied. For single emitters, the results show dramatic improvements in emitter performance by reducing work functions—on the order of 1 eV—and increasing stability. For FEAs, deposition of a ZrC film reduced the operating voltage 30%–50% at an emission current of 1.0 μA/tip and increased the emission stability.

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What this paper is about

Field emission from ZrC films deposited on Si and Mo single emitters and field emitter arrays (FEAs) has been studied. For single emitters, the results show dramatic improvements in emitter performance by reducing work functions—on the order of 1 eV—and increasing stability. For FEAs, deposition of a ZrC film reduced the operating voltage 30%–50% at an emission current of 1.0 μA/tip and increased the emission stability.

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Available abstract

Field emission from ZrC films deposited on Si and Mo single emitters and field emitter arrays (FEAs) has been studied. For single emitters, the results show dramatic improvements in emitter performance by reducing work functions—on the order of 1 eV—and increasing stability. For FEAs, deposition of a ZrC film reduced the operating voltage 30%–50% at an emission current of 1.0 μA/tip and increased the emission stability.

Key concepts: Common emitter, Field electron emission, Materials science, Optoelectronics, Field (mathematics), Deposition (geology), Work function, Nanotechnology

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