1997•Materials Science and Engineering BRequires access

Rapid plasma etching of cubic SiC using NF3/O2 gas mixtures

Christoph Richter, Klaus Espertshuber, Christoph Wagner, Martin Eickhoff, G. Krötz

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Key concepts: Materials science, Etching (microfabrication), Etch pit density, Reactive-ion etching, Dry etching, Substrate (aquarium), Inert gas, Epitaxy

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