Optical Properties of Heavily Doped Semiconductor Layers
S. U. Campisano, E. Rimini, Alessandro Borghesi, G. Guizzetti, L. Nosenzo, A. Stella
Abstract
S. U. Campisano, E. Rimini, Alessandro Borghesi, G. Guizzetti, L. Nosenzo, A. Stella
Abstract
It is shown that a coupled study of the structures due to interband transitions and of the free carrier response in heavily doped semiconductors gives a combined picture of crystal order, free carrier concentration, effective mass and relaxation time. As, P and B ion implanted and laser annealed Si crystals are investigated. Reflectance measurements on samples with free carrier concentrations in the range 10 19 -10 21 cm -3 are reported and discussed.
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It is shown that a coupled study of the structures due to interband transitions and of the free carrier response in heavily doped semiconductors gives a combined picture of crystal order, free carrier concentration, effective mass and relaxation time. As, P and B ion implanted and laser annealed Si crystals are investigated. Reflectance measurements on samples with free carrier concentrations in the range 10 19 -10 21 cm -3 are reported and discussed.
Key concepts: Free carrier, Semiconductor, Doping, Materials science, Relaxation (psychology), Condensed matter physics, Crystal (programming language), Effective mass (spring–mass system)