The BIE100 ECR ion source

BIE100, an all-permanent-magnet-based electron cyclotron resonance (ECR) ion source, has been under development at Berkeley Ion Equipment (BIE). With a relatively small but optimized source magnet volume, the maximum peak magnetic field strengths of the BIE100 reach 13 kG on axis and 11 kG at the plasma chamber walls, respectively. Microwaves of frequencies of 12.75 and 14 GHz are to simultaneously heat the plasma electrons. The development goal of this ECR ion source is to further explore the capabilities of ECR ion source in the efficient production of the intermediate and high charge state rare ion beams needed for the generation of rare ion beams and industrial applications. This article will present the design features of the BIE100 ion source and its current status.