Nicolás Sherwood-Droz, Alexander Gondarenko, Michal Lipson
Abstract
We demonstrate a bulk silicon alternative to SOI, using Si3N4 masking and oxidation techniques. We show waveguide losses of 2.92 dB/cm with a process compatible with the front-end of a typical CMOS fabrication line.
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We demonstrate a bulk silicon alternative to SOI, using Si3N4 masking and oxidation techniques. We show waveguide losses of 2.92 dB/cm with a process compatible with the front-end of a typical CMOS fabrication line.
Key concepts: Silicon on insulator, Silicon, Silicon photonics, Fabrication, Materials science, Optoelectronics, Photonics, Hybrid silicon laser