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Linearity Improvement for Photomask Critical Dimension Metrology with Deep-Ultraviolet Microscope

Takeshi Yamane

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Key concepts: Photomask, Linearity, Critical dimension, Microscope, Optics, Metrology, Materials science, Ultraviolet

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Linearity Improvement for Photomask Critical Dimension Metrology with Deep-Ultraviolet Microscope — Research Paper | ScholarLens