2009•한국진공학회 학술발표회초록집Requires access

Effects of In-Situ Annealed Buffer Layers in Oxygen Plasma on Properties of ZnO Epitaxial Layers Grown by Plasma-Assisted Molecular Beam Epitaxy

Min Su Kim, Do Yeob Kim, Ghun Sik Kim, Hyun Young Choi, Min Young Cho, Su Min Jeon, Kwang Gug Yim, Ji Hoon Kim, Dong-Yul Lee, Joo In Lee, Sung Dong Park, Eundo Kim, Myong Hyo Jung, Do-Weon Hwang, Jae‐Young Leem

Open publisher page 0 citations

Abstract

This record does not include an abstract. Use the full-text link above if available.

About this research paper

What this paper is about

An abstract is not available in the OpenAlex record for this paper.

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Key concepts: Molecular beam epitaxy, Epitaxy, Plasma, Materials science, In situ, Buffer (optical fiber), Annealing (glass), Oxygen