2002Unpublished venueRequires access

Fabrication of gated polycrystalline silicon field emitters

S.E. Huq, Min Huang, Peter R. Wilshaw, Philip D. Prewett

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Abstract

Polycrystalline silicon is currently being investigated as the cathode material for flat panel displays using field emission. Conventional silicon microfabrication techniques have been adapted to produce highly uniform arrays of gridded polysilicon field emitters.

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What this paper is about

Polycrystalline silicon is currently being investigated as the cathode material for flat panel displays using field emission. Conventional silicon microfabrication techniques have been adapted to produce highly uniform arrays of gridded polysilicon field emitters.

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Available abstract

Polycrystalline silicon is currently being investigated as the cathode material for flat panel displays using field emission. Conventional silicon microfabrication techniques have been adapted to produce highly uniform arrays of gridded polysilicon field emitters.

Key concepts: Microfabrication, Polycrystalline silicon, Silicon, Materials science, Fabrication, Field electron emission, Optoelectronics, Cathode

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