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2002•Unpublished venueRequires access

The application of silicon-on-insulator (SOI) technology for the fabrication of fully scanned active matrix flat panel displays

A.C. Ipri, G. Dolny, Fu-Lung Hsueh, R. G. Stewart, David L. Jose, M. B. Spitzer, D.-P. Vu, M Batty, Ron Khormaei, Stephen C. Thayer, Thomas Keyser, Gerry Becker, Mary Tilton, Robert L. Rhoades

Open publisher page 1 citations

Abstract

SOI technology is presently being used for the fabrication of both liquid crystal displays (LCDs) and electroluminescent (EL) displays. It has unique advantages for the fabrication of flat panel displays such as the production of devices with high performance and high breakdown voltage. It is the object of this paper to review the process technologies used in the fabrication of these displays and also to show the latest developments in these technologies.

About this research paper

What this paper is about

SOI technology is presently being used for the fabrication of both liquid crystal displays (LCDs) and electroluminescent (EL) displays. It has unique advantages for the fabrication of flat panel displays such as the production of devices with high performance and high breakdown voltage. It is the object of this paper to review the process technologies used in the fabrication of these displays and also to show the latest developments in these technologies.

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Available abstract

SOI technology is presently being used for the fabrication of both liquid crystal displays (LCDs) and electroluminescent (EL) displays. It has unique advantages for the fabrication of flat panel displays such as the production of devices with high performance and high breakdown voltage. It is the object of this paper to review the process technologies used in the fabrication of these displays and also to show the latest developments in these technologies.

Key concepts: Fabrication, Silicon on insulator, Materials science, Active matrix, Liquid-crystal display, Flat panel display, Optoelectronics, Flat panel

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