2011Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physicsRequires access

Optical properties of silica antireflective films formed in sol‐gel processes

Janusz Jaglarz, Paweł Karasiński, Edyta Skoczek

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Abstract

Abstract The work presents optical properties of sol‐gel derived porous silica films of low refractive index, from 1.2 to 1.3. Due to low refractive index, the porous silica films can be applied to reduce the light reflection coefficient. This allows porous silica films as good candidates for the antireflective coatings (ARC) production. The spectroscopic ellipsometric measurements have been performed for the refractive indices and thickness of silica films determination. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Abstract The work presents optical properties of sol‐gel derived porous silica films of low refractive index, from 1.2 to 1.3. Due to low refractive index, the porous silica films can be applied to reduce the light reflection coefficient. This allows porous silica films as good candidates for the antireflective coatings (ARC) production. The spectroscopic ellipsometric measurements have been performed for the refractive indices and thickness of silica films determination. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Available abstract

Abstract The work presents optical properties of sol‐gel derived porous silica films of low refractive index, from 1.2 to 1.3. Due to low refractive index, the porous silica films can be applied to reduce the light reflection coefficient. This allows porous silica films as good candidates for the antireflective coatings (ARC) production. The spectroscopic ellipsometric measurements have been performed for the refractive indices and thickness of silica films determination. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Key concepts: Anti-reflective coating, Refractive index, Materials science, Porosity, Sol-gel, Reflection (computer programming), Optics, Thin film

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