ScholarLens Back to search
1995•DSpace@MIT (Massachusetts Institute of Technology)Requires access

Deposition and planarization of epitaxial oxide thin films for high temperature superconducting device applications

Bertha P. Chang

Open publisher page 0 citations

Abstract

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995.

About this research paper

What this paper is about

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995.

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995.

Key concepts: Chemical-mechanical planarization, Materials science, Epitaxy, Optoelectronics, Thin film, Superconductivity, Oxide, Deposition (geology)

Related papers

Related paper 1Related paper 2Related paper 3
Back to paper searchBrowse research topicsOriginal source
Deposition and planarization of epitaxial oxide thin films for high temperature superconducting device applications — Research Paper | ScholarLens