2002•The Journal of Chemical PhysicsRequires access

Vesicle adsorption on SiO2 and TiO2: Dependence on vesicle size

Erik Reimhult, Fredrik Höök, B. Kasemo

Abstract

Kinetics of vesicle adsorption on SiO2 and TiO2 surfaces was investigated for vesicle sizes from 25 to 200 nm. On SiO2, nonruptured vesicles are adsorbed up to a critical coverage, Θc, after which spontaneous rupture and bilayer formation occurs in qualitatively the same manner for all vesicle sizes. On TiO2, adsorption of nonruptured vesicles continues up to saturation. A comparison between the kinetics at low coverages on SiO2 and TiO2, where intact vesicles adsorb on both surfaces, reveals that the vesicles on SiO2 are more flattened than nonruptured vesicles adsorbed on TiO2, indicating a stronger vesicle-surface interaction on SiO2.

About this research paper

What this paper is about

Why it matters

OpenAlex reports 269 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Key concepts: Vesicle, Adsorption, Kinetics, Bilayer, Saturation (graph theory), Biophysics, Chemistry, Membrane