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Inflectorless system for introducing injected beam into a pulsed betatron

A. I. Pavlovskiǐ, G.D. Kuleshov, A.D. Tarasov, V. O. Kuznetsov

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Abstract

A device is described for injecting the electron beam into the accelerating region of a pulsed betatron. It consists of two shields, one of which protects the region through which the injected beam is transported from the fringing magnetic field of the accelerator, while the other (which has a profile corresponding to the curvature of the magnetic lines of force) eliminates the nonuniformities of the magnetic field in the acceleration region. The inflectorless injection system was used in pulsed high-current coreless betatrons at injection energies of up to 2 MeV.

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What this paper is about

A device is described for injecting the electron beam into the accelerating region of a pulsed betatron. It consists of two shields, one of which protects the region through which the injected beam is transported from the fringing magnetic field of the accelerator, while the other (which has a profile corresponding to the curvature of the magnetic lines of force) eliminates the nonuniformities of the magnetic field in the acceleration region. The inflectorless injection system was used in pulsed high-current coreless betatrons at injection energies of up to 2 MeV.

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Available abstract

A device is described for injecting the electron beam into the accelerating region of a pulsed betatron. It consists of two shields, one of which protects the region through which the injected beam is transported from the fringing magnetic field of the accelerator, while the other (which has a profile corresponding to the curvature of the magnetic lines of force) eliminates the nonuniformities of the magnetic field in the acceleration region. The inflectorless injection system was used in pulsed high-current coreless betatrons at injection energies of up to 2 MeV.

Key concepts: Betatron, Beam (structure), Magnetic field, Acceleration, Shields, Physics, Cathode ray, Optics

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