2002•Unpublished venueRequires access

Determination of the best incidence angle for ellipsometric measurements

R. Radoi, Costel Flueraru

Abstract

Spectroscopic ellipsometry (SE) is a non-destructive optical method for physical characterization of thin films. From cos/spl Delta/ and tan/spl psi/ (simulated data) is possible to evaluate the best incidence angle in order to obtain the thickness, the composition, the refractive index and the dielectric functions of SiO/sub 2/ layers and interfaces with the least errors.

About this research paper

What this paper is about

Why it matters

OpenAlex reports 2 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Key concepts: Refractive index, Ellipsometry, Angle of incidence (optics), Materials science, Dielectric, Optics, Characterization (materials science), Incidence (geometry)