The fabrication of the holographic echelle gratings

The echelle gratings with the ultra-high resolution are one of the key elements in spectroscopy, optical communications and other fields. Currently, the diamond ruling and the wet etching technique are two primary methods to fabricate echelle gratings. In this paper, we have adopted a new method of the echelle gratings fabrication. Firstly, the holographic lithography is used to form a photoresist grating mask. Then, reactive ion etching is adopted to fabricate the native substrate grating mask to replace the traditional photoresist grating mask, which allows more accurate control of the profile. Finally, the tilted ion-beam etching is used to etch the native substrate grating to ensure the precise control of the blazed angle and anti-blazed angle. A prototype of the echelle gratings with a line density of 80 lp/mm has been fabricated by above method.